Answer to Question #14226 in Plasma Physics for Mohan
How does the frequency affect plasma characteristics? (I am interested in industrial plasma). Most of the papers discuss about energy, pressure, distance between electrodes (in case of CCP reactors) and type of gas as the parameters which affects industrial plasma. What happens if you vary frequency? Say 13.56Mhz and 400kHz RF generators are used to deposit SiN on a wafer via PECVD process. What happens if we lower the frequency keeping all others same? Does the energy required to ionize the gas increases?
In simple words, whether frequency is directly proportional to energy/power required to ionize gas?